Product Introduction

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  4. Wet Method Machine of Development, Etching and Stripping
Flat Panel Display Production related Equipment

Wet Method Machine of Development, Etching and Stripping

Single wafer process equipment performs chemical solution development of exposed resist film and etching with acid.
These equipment can be installed in touch panel production line.

Features and Intended Use

Corresponding to roll to roll films.

An example of specifications

Items Specifications
Target Glass substrate for LCD
Size 370 x 400.470 t 0.4, 0.55, 0.7, 1.1
Basic Specification -
Body size Depth (length in the direction of travel) x Width x Height (with division)
- Approximately 7,530 [mm] x 1,400 [mm] x FL + 1,650 [mm] (not including protrusions)
Body weight Approximately 4,000 kg (dry weight)
Transfer method Horizontal single wafer transfer method

Option

* Specifications are different depend on the substrate size. Please feel free contact us for the details.